TOPCON Vi-1202 is a mask and wafer inspection equipment designed to provide precise inspection of each photomask pattern using advanced pattern recognition algorithms. The system features automated zoom, pattern recognition, print review and scan rate measuring capabilities. Vi-1202 inspects up to 16 autostep fields with a resolution ranging from 0.2-2µm. TOPCON Vi-1202 utilizes a laser autofocusing ability to deliver high-resolution imaging capabilities with additional depth of field and field flattening. The unit is equipped with UV LEDs as its illumination source and imaging sensors providing both surface scan and contour measurement functions. By leveraging its multispectral imaging technology, alignment of wafers can be quickly and accurately achieved.
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