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○Main specifications
・Stage movement: X200mm, Y200mm
・Substage movement amount: X13mm, Y13mm
・Sample table rotation: 180 degrees of coarse movement, 10 degrees of fine movement
・Probe and carrier travel distance: 0~25mm
・Probe and carrier UP/DOWN stroke: Separade 400μm from contact
・Chuck size: ~8 inches (φ200mm)
・Wafer holding method: Vacuum suction method
・Prober external dimensions: Approximately W450 x D550 x H600mm
・Stage movement: X200mm, Y200mm
・Substage movement amount: X13mm, Y13mm
・Sample table rotation: 180 degrees of coarse movement, 10 degrees of fine movement
・Probe and carrier travel distance: 0~25mm
・Probe and carrier UP/DOWN stroke: Separade 400μm from contact
・Chuck size: ~8 inches (φ200mm)
・Wafer holding method: Vacuum suction method
・Prober external dimensions: Approximately W450 x D550 x H600mm
Inquiry - SE-6003A
